Abstract
The possibility of determining thin film growth by means of Auger electron spectroscopy using a new kinetic parameter has been investigated. The ratio ( dI a dt ) ( dI s dt ) monitored as a function of deposition time t where I a and I s are the adsorbate and substrate respectively, may readily distinguish between the Volmer-Weber, Stranski-Krastanov and Frank-van der Merwe growth modes. We also suggest that using this method it is possible to discriminate between the various growth modes even when the adsorbate sticking probability varies as a function of film thickness.
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