On the preferred orientation in Ti1–x Al x N and Ti1–x–y Al x Si y N thin films

Abstract

Abstract The influence of the deposition geometry and the chemical composition on the form and degree of the preferred orientation of crystallites was investigated in TiN, Ti1–x Al x N, and Ti1–x–y Al x Si y N thin films deposited by cathodic arc evaporation. The deposition geometry was varied by changing the angle between the cathodes and the substrates. The chemical composition of the thin films was modified by the choice of the cathodic materials. In TiN thin films, the crystallites were preferentially oriented with the {111} direction perpendicular to the sample surface, independent of the deposition geometry. Besides, a well-pronounced in-plane texture was observed. Co-deposition of Ti, Al, and Si in nitrogen atmosphere stimulated inclination of the texture direction towards the sample surface, which can be described as a change of the texture direction related to the sample surface perpendicular direction, and reduced the amount of the in-plane texture in the coatings (the preferred orientation of crystallites in the plane of the coating).