On the oxidation-reduction kinetics of palladium

Abstract

The oxidation–reduction kinetics of Pd was investigated on polycrystalline Pd foils using XPS and sputter‐depth profiling over a wide range of temperatures. The observed behavior can be explained in terms of a desorption‐controlled process at lower temperatures (T > 230° C) and a diffusion‐controlled process at higher temperatures (T > 450° C). In the intermediate range (230 < T < 450°C) a transition between the two processes is observed which gives rise to a pronounced shoulder in the reduction time trace. The interpretation is qualitatively confirmed using a simple mathematical model for a coupled bulk diffusion/surface reaction system.