Abstract

The induced anisotropy in amorphous (Co 93Zr 7) 100− x (RE) x films has been studied. The sputter deposition was performed in a magnetic field. For RE = Nd, Pr, Dy and Tb, the formation of a well-defined in-plane uniaxial anisotropy K u is related to the single-ion anisotropy of RE atoms. When RE = Gd and Sm, a biaxial anisotropy develops, comprising K u and a perpendicular anisotropy K p. This magnetic structure is expected to be related to the simultaneous formation of two distinct local structural configurations when the deposition temperature is higher than the critical value.

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