On the Origin of Stacking Faults in Pollycrystalline Thin Evaporated Films of Some Face-Centered Cubic Metals

Abstract

In an earlier publication, extra reflections in the transmission electron diffraction patterns of pollycrystalline thin films of some of the face-centered cubic metals have been attributed to stacking faults in these films, (K. Bahadur and P. V. Sastry; Proc. Phys. Soc., London, 78 , (1961) 594). In this paper, an attempt has been made to determine the mechanism whereby the stacking faults get introduced in these films. The precise conditions of evaporation, which give rise to extra reflections in the diffraction patterns of these films, have been studied. It has been shown that the stacking faults arise as a result of misfits occurring at the interface where the nuclei of condensation join together.