Abstract
332 As we showed earlier [1], the remote plasmaenhanced chemical vapor deposition (RPE-CVD) process used for film fabrication makes it possible to preserve intact fragments of a precursor molecule that are required to synthesize the desired material. Despite close attention given by researchers to such processes, most works in this field deal with the study of the dependence of the properties of the film material on the synthesis conditions, while the mechanism of plasmaassisted activation of precursor molecules remains beyond the area of experimental interest [2–4].
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