On the Long-Range Effect in Argon-Implanted Vanadium and Its Alloy V–4.51Ga–5.66Cr

Abstract

The long-range effect that manifests under Ar+ ion implantation into vanadium and its alloy V–4.51Ga–5.66Cr is studied experimentally. Irradiation is carried out in an ILU ion-beam accelerator (energy of Ar+ ions, 20 keV; dose, 1.0 × 1022 m–2; and fluence, 6 × 1018 m–2 s–1). The target temperature increases during ion-beam bombardment up to ~700 K. It was demonstrated that ion bombardment under the indicated conditions is accompanied by a long-range effect consisting in an increase of the target microhardness, both on the exposed and reverse sides, in double-sided modification of the target’s texture and surface topography. These data are in qualitative agreement with both mechanisms and models proposed to date to explain the observed long-range effects. They are based on the development of a dislocation network in static stress fields that are caused by impurity atoms implanted at high implantation doses and their migration very deep into the bulk of the target.