Abstract

The present work attempts to provide a different approach to understand the distribution of injected charge in Si-rich SiN films that find application in MEMS capacitive switches. The study employs Thermally-Stimulated-Depolarization-Current measurements to calculate the collected charge dependence on film thickness and show that the injected charge distribution is different from simulated ones. Moreover, employing Kelvin Probe surface potential decay measurements calculates the discharge current towards the film surfaces and bulk as well as their dependence on material stoichiometry.

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