On the influence of ion energy and incidence angle on Auger depth profiles of binary alloys

Abstract

Sputter behavior of a binary Ag-16%Pd alloy has been investigated by varying the ion energy between 0.5 and 5 keV and the angle of incidence of the ion beam between 0 and 71°. Results are compared to models describing the transient behavior and the steady state surface enrichment. The variation of the relative sputter yield of the pure metals with energy and angle of incidence and matrix effects of the alloy are taken into account. The effective altered layer thickness increases from 1.6 to 3.4 nm with increasing ion beam energy but is independent of angle of incidence. The experimental steady state peak amplitude ratio of Ag/Pd is slightly lower than that calculated based on the sputter yield of the pure metals.