Abstract
The electrochemical behaviour of the anodic oxide film on tungsten during, or after, interruption of current flow was studied in HCOOH and CH3COOH solutions by galvanostatic and capacitance techniques. The results show the conditions under which enhancement of film growth occurs as revealed from its formation and dissolution characteristics. The results also show the possibility of the electrochemical oxidation of formic acid by the thick oxide film on tungsten. The importance of this electrocatalytic process is the occurrence of the oxidation process without appreciable oxygen evolution. The galvanostatic oxidation of tungsten in HCOOH as a reducing agent can be considered as a novel method for the preparation of a class of oxides; oxidation with simultaneous partial reduction.
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