Abstract
This work aims at studying the electrochemical behavior of annealed pure titanium (Ti) and nano-structured (NS) Ti coating in borate buffer solutions. Cathodic arc evaporation was successfully applied to deposit NS Ti coating. Samples were characterized by means of scanning electron microscope and x-ray diffraction. Potentiodynamic polarization tests, electrochemical impedance spectroscopy, and Mott-Schottky analysis were employed to discuss the electrochemical behavior of samples thoroughly. Electrochemical measurements showed that the deposited NS Ti coating offers a superior passivity in borate buffer solutions of pH 9.0 and 9.5. Mott-Schottky analysis revealed that all passive films are of n-type semiconducting nature in these alkaline solutions and the deposition process did not alter the semiconducting type of passive films formed on samples. Additionally, this analysis showed that the NS Ti coating possessed lower levels of donor densities. Finally, all electrochemical tests showed that passive behavior of the NS Ti samples was superior, mainly due to the formation of thicker and less defective passive films.
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