Abstract
Analytical expressions have been derived to describe the dynamics of one‐dimensional and two‐dimensional (with plug‐type flow) (PF2D) representations of an isothermal radial flow reactor etching silicon in a nitrogen trifluoride plasma. These predictions are compared with the numerical solution of a more realistic two‐dimensional model, i.e., one that features laminar flow (LF2D). Further, the one‐dimensional model has been compared at steady state with the LF2D model over a range of parameters in an effort to determine the range of validity of the one‐dimensional model. The influence of volume change has been shown to be significant for the steady state as well as the transient behavior of the system.
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