Abstract
The electron work function (EWF) is an important parameter of a semiconductor. The understanding of the correlation between the EWF and surface morphology is of much significance for revealing related photoelectric mechanisms. In this study, the surface of indium tin oxide (ITO) was treated by chemical corrosion or absorption of copper phthalocyanine molecules, and their changes in EWF were systematically investigated using scanning Kelvin probe. The decrease of the EWF with the increase of surface roughness was found. Based on a microcapacitor model, the correlation between the EWF and surface microstructures was built up, which was well consistent with the experimental results. These data are of help for improving the photoelectric behaviors of ITO-based devices by adjusting surface/interface structures.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
