Abstract
The production of both normal and abnormal methyl radicals by UV photolysis has been studied on silica gel surfaces at various pretreatment temperatures and also following γ-radiolysis of the surface. The evidence presented suggests that it is the site of stabilisation rather than the site of absorption which is the important factor in determining which type of methyl radical is observed. The effect of γ-radiolysis products on the formation of the abnormal methyl radicals is discussed.
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