Abstract
Traditionally, digital testing of integrated semiconductor circuits has focused on manufacturing defects. There is another class of failures that happens due to circuit marginalities. Circuit-marginality failures are on the rise due to shrinking process geometries, diminishing supply voltage, sharper signal-transition rates, and aggressive styles in circuit design. There are many different marginality issues that may render a circuit nonoperational. Capacitive cross coupling between interconnects is known to be a leading cause for marginality-related failures. In this paper, we present novel techniques to model and prioritize capacitive crosstalk faults. Experimental results are provided to show effectiveness of the proposed modeling technique on large industrial designs.
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