Abstract
For a series of electrically non-conductive, sintered ceramic samples with the nominal composition Si 0.05 (Al x Ti 1-x ) 0.95 O y (x being varied from 0 to 1 in steps of Δx = 0.1), the influences of elemental concentration and of the sputtering frequency in the plasma-SNMS high frequency mode on relative sensitivity factors were investigated. For Al and Ti they show strong matrix effects which may arise from the emission of positive secondary ions.
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