Abstract
We report a refinement of the Fermi function approximation to compute the Refractive Index Profile of optical waveguides formed by ion implantation. The computation is carried out at an exact value of the phase step at the upper boundary of a planar optical waveguide with allowances for the perturbative influence of the prism coupling element. It is shown that under real experimental conditions the method can be simplified and is applicable to the low-mode waveguides.
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