Omnidirectional antireflection and electrochromic properties of WO3 nanorods prepared by oblique angle deposition

Abstract

In this study, the electrochromic tungsten oxide (WO3) nanorods were successfully prepared by reactive dc magnetron sputtering with oblique angle deposition (OAD) technique on silicon (100) wafer, glass slide and ITO coated glass substrates. The influence of sputtering power on the WO3 nanorods were investigated by grazing incident X-ray diffractometer, field emission scanning electron microscope and spectrophotometer. The thickness of the WO3 nanorods layer was controlled at 400 nm by adjusting the deposition time in order to optimize the electrochromic property. These WO3 nanorods had an amorphous and high transmittance with omnidirectional antireflection property. In addition, the prepared electrochromic WO3 nanorods sample were also shown high optical contrast which demonstrated considerable potential in the smart window application.