Abstract
Organosilicate glass (OSG) coatings with a range of compositions have been deposited using , He, and octamethylcyclotetrasiloxane as a precursor in a plasma-enhanced chemical vapor deposition process. Rutherford backscattering spectrometry and forward recoil spectrometry were used to determine the composition of the coatings. The measurements show that addition of carbon and hydrogen lowers the density of the coatings, effectively reducing the concentration of the polarizing species. The dielectric constant is further lowered by a reduction of the ionic and orientation polarizabilities. Fourier transform infrared measurements show that as more C and H are incorporated, the siloxane network is more frequently interrupted by terminal methyl and H groups. Based on the experimental results a quantitative model for the OSG structure is proposed and the inverse infrared absorption cross sections of various absorption bands are determined, some of which for the first time. The structural model also makes it possible to calculate the average electronic polarizability of the various bond configurations in the OSG.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
