Abstract

In this work, we present two new pairs of formulas to obtain a spectroscopy of the density of states (DOS) in each band tail of hydrogenated amorphous silicon (a-Si:H) from photoconductivity-based measurements. The formulas are based on the knowledge of the small-signal recombination lifetime τ′, the characteristic decay time of the concentration of trapped carriers generated in excess by the illumination, and that can be measured by methods like the Oscillating Photocarrier Grating (OPG) or Moving Grating Technique (MGT). First, we deduce the formulas and test their accuracy by numerical simulations using typical a-Si:H parameters. Next, we characterize an a-Si:H sample using well-known methods, like Fourier transform photocurrent spectroscopy to evaluate the valence band tail and modulated photoconductivity to measure the conduction band tail. We also performed measurements of steady-state photoconductivity, steady-state photocurrent grating and MGT, for a range of generation rates. From these measurements—and taking typical values for the capture coefficients, the extended states mobilities and the DOS at the band edges—we apply the new formulas to get the band tails. We find that the results obtained from the application of our formulas are in good agreement with those found with the traditional methods for both band tails. Moreover, we show that MGT/OPG measurement to get τ′ can be avoided if one of the band tails is measured by one of the traditional methods, since the known band tail can be used to evaluate τ′ with one pair of equations, and then the other pair can be applied to get the other band tail.

Highlights

  • The disorder present in the structure of hydrogenated amorphous Silicon (a-Si:H) leads to the presence of localized states that extend inside the gap of the semiconductor as band tails

  • We find that the results obtained from the application of our formulas are in good agreement with those found with the traditional methods for both band tails

  • To estimate the density of states (DOS) between the valence band edge and the Fermi level, some methods based on the deconvolution of the absorption coefficient have been proposed,1–3 which in turn can be obtained by techniques like Constant Photocurrent Method (CPM),4 Dual Beam Photoconductivity (DBP),5 Photothermal Deflection Spectroscopy (PDS)6 or Fourier Transform Photocurrent Spectroscopy (FTPS)

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Summary

INTRODUCTION

The disorder present in the structure of hydrogenated amorphous Silicon (a-Si:H) leads to the presence of localized states that extend inside the gap of the semiconductor as band tails. Some methods based on making interference between two coherent light beams have been proposed for this part of the DOS of a-Si:H;10 in particular, we have recently proposed the combined use of Oscillating Photocarrier Grating (OPG) and Moving Grating Technique (MGT) for this purpose.11 These methods provide information about the small-signal excess electron lifetime, sn0, which is the characteristic time with which the total electron concentration adapts to a small change in the illumination intensity. The partial derivatives with respect to the generation rate should be equal: sn0 1⁄4 @nT/ @G should be equal to the corresponding time for holes, sp0 1⁄4 @pT/@G This common small-signal recombination lifetime s0 should provide information about the CBT and about the valence band tail (VBT). The Appendix gathers some basic equations valid for amorphous semiconductors that are used in the rest of this work

New equations for band tail spectroscopy
G L2amb þ RV r
Deduction of the formulas
NUMERICAL SIMULATIONS
EXPERIMENTAL
RESULTS AND DISCUSSION
CONCLUSION

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