Abstract
The method of TiSiCN-coatings deposition by anodic evaporation of Ti and decomposition of an organosilicon precursor (hexamethyldisilazane) in a low-pressure (∼1 mTorr) nitrogen-argon arc discharge with a self-heated hollow cathode is investigated. The plasma composition was analyzed by optical emission spectroscopy. TiSiCN coatings with a thickness of up to 10 microns and a hardness of up to 30 GPa were obtained in 1.5 hours at a temperature of 400°C.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
