Abstract

Narrow-gap semiconductors such as InAs or InSb are known for their strong spin-orbit interactions. Therefore, heterostructure such as InAs/AlInAs is an attractive system for its potential applications to spin FETs. If the heterostructure is homoepitaxially grown on p-InAs substrate, the high crystal quality is expected and hence the high mobility and enhanced spin-orbit interaction. However, the InAs heterostructure grown on InAs is intrinsically suffered from the substrate leak current due to its narrow-gap nature. Here we report the strained growth and characterization of InAs/AlInAs heterostructure on GaAs substrate by molecular beam epitaxy (MBE) and show that the strong spin-orbit interaction is obtained while substrate leakage current is substantially suppressed.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call