Abstract
Dynamics of ablation of fused silica by multiwavelength excitation process using F2 and KrF excimer laser has been investigated by energy analyzed mass spectrometry of ablated species. The number of generated Si+ ion by multiwavelength excitation process corresponds to that by single-F2 laser ablation and to approximately 2.1 times higher than that by single-KrF excimer laser ablation. In addition, kinetic energy distribution of Si+ ablated by multiwavelength excitation process shows almost same as that by single-F2 laser ablation. We regard that absorption of KrF excimer laser by excited state generated by F2 laser (excited-state absorption: ESA) causes effective photoionization, resulting in enhancement of Si+ with higher kinetic energy and then in high-quality ablation.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: IEEJ Transactions on Electronics, Information and Systems
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
