Abstract

We report on the first direct demonstration of the possibility to generate extreme ultraviolet (EUV) radiation with a freely expanding jet of dense plasma with multiply charged ions supported by high-power microwaves. The detected emission power is about 20 W at 18–50 nm for argon and xenon and 0.3 W at 13–17 nm for xenon. The discharge with a peak electron density of up to 3×1016 cm−3 and a characteristic size of 150 μm is supported by the focused radiation of a recently developed gyrotron with unique characteristics, having a 250 kW output power at 250 GHz and operated in a relatively long (50 μs) pulse mode. Up-scaling of these experimental results gives grounds for the development of a point-like kilowatt-level EUV source for high-resolution lithography, which is able to meet the requirements of the microelectronics industry.

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