Abstract
ABSTRACT We investigate the potential for the emission lines O v] λλ1213.8,1218.3 and He ii λ1215.1 to contaminate flux measurements of Ly α λ1215.7 in the extended nebulae of quasars. We have computed a grid of photoionization models with a substantial range in the slope of the ionizing power law (−1.5 < α < −0.5), gas metallicity (0.01 < Z/Z⊙ < 3.0), gas density (1 < nH < 104 cm−3), and ionization parameter (10−5 < U < 1.0). We find the contribution from He ii λ1215.1 to be negligible, i.e. <0.1 of Ly α flux, across our entire model grid. The contribution from O v] λλ1213.8,1218.3 is generally negligible when U is low (≲10−3) and/or when the gas metallicity is low (Z/Z⊙ ≲ 0.1). However, at higher values of U and Z we find that O v] can significantly contaminate Ly α, in some circumstances accounting for more than half the total flux of the Ly α + He ii + O v] blend. We also provide means to estimate the fluxes of O v] λλ1213.8,1218.3 and He ii λ1215.1 by extrapolating from other lines. We estimate the fluxes of O v] and He ii for a sample of 107 Type 2 active galaxies at z > 2, and find evidence for significant (≥10 per cent) contamination of Ly α fluxes in the majority of cases (84 per cent). We also discuss prospects for using O v] λλ1213.8,1218.3 as a diagnostic for the presence of AGN activity in high-z Ly α emitters, and caution that the presence of significant O v] emission could impact the apparent kinematics of Ly α, potentially mimicking the presence of high-velocity gas outflows.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.