Abstract
Roll-to-roll ultraviolet (R2R-UV) imprinting is a low-cost and high-throughput method that includes the manufacturing of large-area functional films. However, the quality of the final product is obstructed by the bubble entrapment during the imprinting process. In this study, a multi-phase volume of fluid (VOF) numerical model was used to remove bubble entrapment during the R2R imprinting process, which covered all parameters. This new modified numerical model with open-channel boundary conditions was based on the single zone that contains the direct contact of UV resin with the imprinting mold during the filling process. In addition, this model simulated the UV resin filling into microcavities at the preceding and succeeding ends of the imprinting mold. Different patterns of imprinting mold were considered to enhance the fidelity of R2R-UV imprinting for the comprehensive analysis. The experimental results validated through numerical simulations revealed that the bubble entrapment can be controlled by varying various parameters such as speed of the imprinting system, viscosity, contact angles, and pattern shape. The proposed model may be useful for a continuous bubble-free R2R imprinting process in industrial applications that includes flexible displays and micro/nano-optics.
Highlights
The nano-patterning techniques for nano-imprint lithography (NIL) have attracted many research groups due to its practical implication on an industrial scale
Different patterns of imprinting mold were considered to enhance the fidelity of R2R-UV imprinting for the comprehensive analysis
The experimental results validated through numerical simulations revealed that the bubble entrapment can be controlled by varying various parameters such as speed of the imprinting system, viscosity, contact angles, and pattern shape
Summary
The nano-patterning techniques for nano-imprint lithography (NIL) have attracted many research groups due to its practical implication on an industrial scale. Ahn et al [1] were the pioneers who introduced roll-to-roll ultraviolet nano-imprint lithography (R2R-UV-NIL) by replicating lenticular lens patterns on polyethylene terephthalate (PET) substrate. R2R-UV-NIL is one of the most promising technologies that fabricate low-cost, high-throughput, and large-area micro/nano features on functional films. R2R-UV-NIL is a process-based batch NIL used to replicate nano/micro-scale patterns from a surface of the patterned mold to a large area of the flexible or rigid substrate. High fidelity and productivity in NIL represent the complete filling of resin in nano/microcavities or exact replication of imprint patterns from the imprinting mold on a PET or polydimethylsiloxane (PDMS) substrate
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