Abstract
Temperature control is an important indicator for the lithography. However, the factors causing temperature fluctuation in lithography remain unclear under a low-pressure environment. In this work, in order to study the jet impingement heat transfer of hydrogen under rarefied conditions, the direct simulation Monte Carlo (DSMC) method and the finite difference method (FDM) are coupled. The heat exchange capacity in the jet impingement obtained using DSMC method is treated as a boundary condition for substrate. The difference of impingement heat transfer of rarefied hydrogen jet under different conditions of inlet absolute pressure, impingement distance and jet aperture are studied. The temperature of substrate is calculated by FDM. Results show that heat exchange capacity of the jet impingement rises with an increasing the inlet absolute pressure and pipe diameter, drops with reducing impact distance. The temperature control requirements can be met when the heat exchange capacity exceeds 380 W/(m2·K), the structural parameters satisfying the temperature control requirement are demarcated. The aforementioned findings can provide design ideas for high-precision temperature control devices.
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