Abstract
In the framework of the CERN-RD50 Collaboration, the adoption of p-type substrates has been proposed as a suitable mean to improve the radiation hardness of silicon detectors up to fluencies of 1times10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">16</sup> n/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> . In this work two numerical simulation models will be presented for p-type and n-type silicon detectors, respectively. A comprehensive analysis of the variation of the effective doping concentration (N <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">eff</sub> ), the leakage current density and the charge collection efficiency as a function of the fluence has been performed using the Synopsys T-CAD device simulator. The simulated electrical characteristics of irradiated detectors have been compared with experimental measurements extracted from the literature, showing a very good agreement. The predicted behaviour of p-type silicon detectors after irradiation up to 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">16</sup> n/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> shows better results in terms of charge collection efficiency and full depletion voltage, with respect to n-type material, while comparable behaviour has been observed in terms of leakage current density
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