Numerical Simulation of Heat Load for Multilayer Laue Lens under Exposure to XFEL Pulse Trains

Abstract

Multilayer Laue lenses (MLLs) made from WC and SiC were previously used to focus megahertz X-ray pulse trains of the European XFEL free-electron laser, but suffered damage with trains of 30 pulses or longer at an incident fluence of about 0.13 J/cm2 per pulse. Here, we present numerical simulations of the heating of MLLs of various designs, geometry and material properties, that are exposed to such pulse trains. We find that it should be possible to focus the full beam of about 10 J/cm2 fluence of XFEL using materials of a low atomic number. To achieve high diffraction efficiency, lenses made from such materials should be considerably thicker than those used in the experiments. In addition to the lower absorption, this leads to the deposition of energy over a larger volume of the multilayer structure and hence to a lower dose, a lower temperature increase, and an improved dissipation of heat.