Abstract

Chemical Vapour Deposition (CVD) processes constitute an important technology for manufacturing thin solid films. Applications include various films on wafers in the IC-industry, decorative coatings, anti-reflection and spectrally selective coatings on optical components, and anti-corrosion and anti-wear layers on mechanical tools. CVD is very versatile and offers good control of film structure and composition, excellent uniformity, and the capability of conformal deposition on highly irregularly shaped surfaces. CVD processes have been reviewed in e.g. refs. [l]-[6].

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