Abstract
A reliable and predictive feature profile evolution simulator could be a very important tool for the nanotechnology and semiconductor industry. It would allow significant saving of time and resources otherwise spent on design experiments to find proper chemistries and conditions in a multidimensional parameter space in search for advanced etching and deposition. A recently developed general feature profile simulator (FPS-3D) optimized for computational speed, reliability, and graphics capability is discussed, and a couple of images from simulations are presented.
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