Abstract
This research provides the numerical simulation of the plasma generation in a hollow cathode as well as the diffusion of nitrogen atoms into the metal in the low-pressure glow discharge plasma. The characteristics of the gas discharge were obtained and the relation of the basic technological parameters and the structural and phase state of the nitrided material were defined. Authors provided the comparison of calculations with the experimental results of titanium nitriding by low-pressure glow discharge plasma in a hollow cathode.
Highlights
The ion-plasma surface treatment in plasma gas discharge, the nitriding treatment have been increasingly developed [1,2,3,4,5,6,7,8,9] in recent years
The target material for plasma treatment is immersed into the gas plasma where ions accelerated towards the target in the double electric layer between the target and the discharge column
The titanium ВТ1-0 was nitrided in the non-self-sustained glow discharge plasma with a hollow cathode under a low pressure and different temperatures T = 550, 650, 850 С during five hours
Summary
The ion-plasma surface treatment in plasma gas discharge, the nitriding treatment have been increasingly developed [1,2,3,4,5,6,7,8,9] in recent years. The vacuum plasma technology on the ground of low temperature glow discharge plasma is used for the surface modification of materials and bulk items [4,5,6,7,8,9], when the ion current density of ~ 1 mА/cm over the treated surface as well as the discharge voltage of hundreds volt to be provided [8,9,10,11]. The main parameters for the plasma treatment are gas mixture, temperature and time of the process, operating pressure, ion current density to the target surface and the ion energy.
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