Abstract
Top-gate amorphous indium gallium zinc oxide (IGZO) thin-film transistors (TFTs) are designed with numerical analysis to control their electron potential energy. Design simulations show the effects of structural design on the electrical characteristics of these TFTs. In particular, the thicknesses of the channel (tch) and conducting (tc) layers, which play vital roles in TFT electrical performance, are varied from 1 to 50 nm to investigate the effect of thicknesses on the electron potential energies of the channel region and the electrode-semiconductor interfaces. The potential energies are precisely optimized for efficient charge transport, injection, and extraction, thus enhancing the electrical performance of these devices. It is also demonstrated that tch mainly affects mobility and threshold voltage, while tc mainly affects on-current. An acceptable threshold voltage of 0.55 V and high mobility of 14.7 cm²V-1s-1 are obtained with a tch of 30 nm and tc of 10 nm. Controllability of the electron potential energies and electrical performance of IGZO TFTs by means of structural design will contribute to realization of next-generation displays that have large areas and high resolutions.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
