Abstract
Laminar film condensation in upward and downward vapor flows is numerically investigated by using a sharp-interface level-set method to track the condensate film surface and accurately calculating the phase-change mass flux under the saturation temperature condition at the interface. An analytical model for steady laminar film condensation in upward as well as downward vapor flows is developed to validate the present numerical results. As the vapor velocity increases, the condensation rate is observed to decrease in upward vapor flows whereas it increases in downward vapor flows. The effects of vapor velocity and wall temperature on laminar film condensation in upward and downward vapor flows are investigated.
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