Abstract
Magic angle spinning (MAS) nuclear magnetic resonance (NMR) for <SUP>19</SUP>F and 1H nuclei was used how exposure to high-pressure (70 MPa) H₂ gas affected an O-ring material. <SUP>19</SUP>F MAS NMR revealed that poly(vinylidenefluoride-co-hexafluoroprophylene) in VDF/HFP = 76.1/23.9 mol % (FKM type 1) was involved in the O-ring material. This copolymer may undergo main-chain scission and termination to -CF₂H end groups during depressurization of high-pressure H₂. Evidence for formation of additional -CF₂H end group includes a small increase in the <SUP>19</SUP>F MAS NMR signal at -96 ppm, and a corresponding ¹H MAS NMR signal at 7.1 ppm in comparison with those in the material that had not been exposed to high-pressure H₂. Neither the <SUP>19</SUP>F nor the ¹H MAS NMR showed chemical shift after exposure to H₂; this absence of response means that exposure to H₂ did not affect the structure of the polymer.
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