Abstract

TiO2(B) mesoporous thin films were grown in two steps on the F-doped SnO2 conductive glass substrates. In the first step, a small amount of H3PO4, corresponding to 0.15−0.375 wt % P on TiO2 basis, was introduced into concentrated HCl which was subsequently used for hydrolysis of titanium ethoxide. The hydrolyzed colloidal TiO2 suspension was further mixed with a 1-butanol solution of the amphiphilic triblock copolymer Pluronic P123. The obtained precursor mixture was used for dip coating of FTO substrates. To achieve over 1 μm thick films, dip coating (followed by a thermal treatment at 350 °C/2 h) was repeated several times to produce multilayer films. The films consisted of amorphous TiO2 with small amounts of anatase and TiO2(B). The amorphous part was converted into the TiO2(B) in a simple firing step at 500−550 °C. The formation of TiO2(B) phase was accompanied by a significant increase of the film thickness. The films demonstrated unique behavior during the electrochemical lithium insertion that wou...

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