Abstract

Future magnetic recording media require firm control of the microstructure particularly with uniform grain size at the nanometer scale. Using self-assembling block copolymers as an etch-mask, a novel underlayer is patterned with a carefully designed surface morphology. Two-phase growth with magnetic grains encircled by an oxide phase is guided by the templated underlayer to create high-coercivity magnetic media with uniform grain size at the nanoscale.

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