Abstract
Abstract While a high supply voltage (>15 V) is needed in the conventional EPD (electrophoretic deposition) methods, we propose a novel method in which deposition of dielectric films can be carried out using a low voltage (<10 V); we have used this method for the deposition of MgTiO3 films. MgTiO3 powder was dispersed in a solution of ethanol–Ti4+ with 3–9 V. Subsequently, the deposition of a MgTiO3 film with spherical nano-particles in aggregated random shape particles was observed at the anode.
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