Abstract
AbstractSummary: The influence of the azobenzene concentration on the photo‐induced surface relief grating (SRG) formation in polymer films was investigated. Two series of polymers with 4‐alkoxy‐4′‐cyanoazobenzene side groups were synthesized. In series A, the degree of substitution was varied, while in series B, azobenzene and biphenyl groups were introduced in varying composition, but the concentration of non‐reacted HEMA‐groups was kept constant. Photo‐induction of the dichroism and the SRG was studied as function of the azobenzene concentration. An optimum was found for the SRG formation (76%), while the highest dichroism was induced at the lowest azobenzene concentration of 20%. The restriction of rotational and translational molecular motions observed at higher azobenzene concentration was explained by π‐π stacking of the azobenzene moieties and interaction of unreacted HEMA groups.AFM topography image of surface relief grating in polymer B‐76.magnified imageAFM topography image of surface relief grating in polymer B‐76.
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