Abstract
A novel planarization scheme, consisting of compression of a low glass transition temperature (Tg) and low viscosity poly(methyl methacrylate) (PMMA) polymer into grooves of patterned recording media using a surface with flat morphology, has been proposed and investigated. Si (100) surface was used as the smooth surface for pressing PMMA onto the patterned media. Patterned samples prepared with such a planarization method showed very smooth topography of roughness as small as 3 A (which is comparable to present hard disk media based on continuous film) by atomic force microscope. A magnetic sacrificial layer is proposed in addition as a solution to etching or polishing issues.
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