Abstract
Abstract Utilizing a surface modification of polysilane film due to photodecomposition by patterned UV-light irradiation, we have confirmed that polysilanes have a potential application as a material for novel offset printing, which will enable us to skip the alkaline development process required in current offset printing. This has been achieved by a wettability change of photodecomposable polysilane and a modified fountain solution. It has been found that the hydrophilicity in the UV-exposed area is sufficiently maintained by a treatment with tris(2-hydroxyethyl)methylammonium iodide added to the fountain water, which rejects an oil ink in the printing process.
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