Novel layout technique for single-event transient mitigation by the groove structure

Abstract

Based on the damage mechanism of single-event transient (SET) in a MOS device, a new irradiated reinforcement uniaxial strained Si Nano NMOSFET device is further proposed, and the new structure device has no effect on the electrical properties of its original structure. Moreover, the new reinforced device of groove structure can efficiently reduce not only charge collection but also SET pulse widths (WSET). Compared with the conventional NMOS and drain-wall structure, we find that the proposed novel layout technique can provide the best benefit of SET mitigation with a small sacrifice in the effective area. Therefore, the successful development of the research results will play a positive role in promoting the theoretical and technological progress of high-performance radiation-resistant core electronic components and lay a foundation and create conditions for their application in space radiation and nuclear radiation.