Abstract
We present a combined nanoimprint and photolithography (CNP) process for nano-size patterning to greatly simplify conventional ultraviolet nanoimprint lithography. The mold is a key component for precise patterning with CNP, and a novel hybrid mask mold with SiO 2 interlayer and hydrophobic agent treatment is suggested for easy detachment after imprinting. This allows a very simple process to get a complete pattern transfer without any defects.
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