Abstract
A cost effective bottom-up process for the fabrication of micro thermoelectric generators (μTEGs) was developed. It is based on a novel fabrication method involving a selectively sacrificial photoresist for the sequential galvanostatic electrodeposition of thermoelectric materials. The use of an industrial pick and placer (P&P) for dispensing the second photoresist allows for accurate and flexible μTEG designs. The process makes use of Ordyl® as a negative dry film photoresist template and sequential lamination steps for shaping all thermoelectric legs and contacts. All structures of the μTEG are generated in one photoresist multi-layer - this represents the most significant advantage of the process. The process uses a minimum of clean room processing for the preparation of pre-structured substrates for electrodeposition and therefore provides a cost-effective, highly flexible fabrication platform for research and development.
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