Abstract
Diamond thin films are grown on silicon substrates by only using methanol and argon mixtures in microwave plasma chemical vapor deposition (MPCVD) reactor. It is worth mentioning that the novel strategy makes the synthesis reaction works smoothly without hydrogen atmosphere, and the substrates temperature is only 500 °C. The evidence of surface morphology and thickness under different time is obtained by characterizing the samples using scanning electron microscopy (SEM). X-ray diffractometer (XRD) spectrum reveals that the preferential orientation of (111) plane sample is obtained. The Raman spectra indicate that the dominant component of all the samples is a diamond. Moreover, the diamond phase content of the targeted films was quantitatively analyzed by X-ray photoelectron spectroscopy (XPS) method, and the surface roughness of diamond films was investigated by atomic force microscope (AFM). Meanwhile, the possible synthesis mechanism of the diamond films in methanol- and argon-mixed atmosphere was discussed.
Highlights
Diamond films have been widely used in optical, mechanical, electrical, and biology fields because of its excellent physical and chemical properties [1, 2]
The ultrananocrystalline diamond film was synthesized by Ar–H2– CH4 gas mixture [9]; the nanocrystalline diamond film was prepared by Ar–H2–CH4–O2 gas mixture [10]; and the microcrystalline diamond was grown in H2–CH4 gas mixture [11]
Diamond films were synthesized in a 2.45-GHz, 8-kW microwave plasma chemical vapor deposition (MPCVD) system [1], and the liquid CH3OH was introduced into reaction chamber by Ar bubbling
Summary
Diamond films have been widely used in optical, mechanical, electrical, and biology fields because of its excellent physical and chemical properties [1, 2]. The main methods of diamond films preparation are chemical vapor deposition (CVD) and physical vapor deposition [6]. CVD method shows many advantageous features including simple film-forming equipment and high purity and uniformity of the diamond films. The technique of microwave plasma CVD is most widely used to synthesize diamond films with high purity and uniformity [8]. These synthesis methods of diamond films frequently rely on the high-pressure and high-purity hydrogen or methane, which have the potential risk and are high cost. In order to reduce the usage of hazardous gas, the investigator tries to use the liquid diffusion as a
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
