Abstract
AbstractModern thin film deposition systems must be designed for maximum flexibility with respect to their physical footprint as well as the range of processes and materials they can support. Increasingly disciplines that have not traditionally utilized thin film deposition, such as biology and medicine, are demanding that materials never intended for vacuum be applied on a molecular level. Multi‐user nanofabrication facilities are tasked to adapt and accommodate new requirements while also making room for new tools in environments which may already be over crowded. New system designs, mindful of these challenges, are discussed.
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