Novel Concepts for Low-pressure, Low-temperature Nanodiamond Growth Using MW-linear Antenna Plasma Sources

Abstract

AbstractIndustrial applications of PE MWCVD diamond grown on large area substrates, 3D shapes, at low substrate temperatures and on standard engineering substrate materials require novel plasma concepts. Based on the pioneering work of the group at AIST in Japan, high-density coaxial delivery type of plasmas have been explored [1]. However, an important challenge is to obtain commercially interesting growth rates at very low substrate temperatures. In the presented work we introduce the concept of novel linear antenna sources, designed at Leybold Optics Dresden, using high-frequency pulsed MW discharge. We present data on high plasma densities in this type of discharge (> 10 E11 cm-3), accompanied by data from OES for CH4 – CO2 - H2 gas chemistry and the basic properties of the nano-crystalline diamond (NCD) films grown.