Abstract
SummaryIn the present article three different coatings systems are discussed based on reactive and non‐reactive sputtering processes utilizing HiPIMS, pulsed DC and DC magnetron sputtering. The HiPIMS platform was used to develop a very hard TiB2 coating with a low residual stress level. Pulsed DC magnetron sputtering was used to deposit 50 μm thick amorphous Al2O3 coating. Finally DC magnetron sputtering was used to deposit a Sr‐Ti‐O coating capable of releasing Sr facilitating accelerated bone formation and implant ingrowth.
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