Abstract
We propose a novel circuitry configuration for high-density 90-nm embedded resistive random access memory (ReRAM). The memory cells are operated at 2 V, and a small memory cell size of 6F2 consisting of a 1.2-V standard transistor and a resistive junction (1T–1R) is designed, where F is the feature size. The unique circuitry configuration is that each pair of source-lines connects to each source-line selective gate. Therefore, erasing is done by a pair of cells in turn in the whole sector, while the reading or programming is done by a random accessing operation. We simulated the ReRAM circuit for read and write operations with SPICE. As a result, we found that 5-ns high-speed read access was obtained in the 256-word lines (WLs) × 256-bit lines (BLs) and that the SET/RESET operation was stable.
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