Abstract
We developed novel methods for producing negative C60 ion beams at the accelerator facility Takasaki Ion Accelerators for Advanced Radiation Application (TIARA) to increase the current intensity of swift C60 ion beams accelerated to the MeV energy region using a tandem accelerator. We produced negative C60 ion beams with an intensity of 1.3 µA, which is several tens of thousands of times greater than the intensity of beams produced using conventional methods based on the Cs sputtering process. These beams were obtained by temporarily adding an ionization function based on electron attachment to an existing ion source that is widely used in tandem accelerators. The high-intensity swift C60 ion beams can be made available relatively easily to institutes that have tandem accelerators and ion sources of the type used at TIARA because there is no need to change existing ion sources or install new ones.
Highlights
The production of C60 ion beams in the MeV energy region using tandem accelerators in the 1990s enabled some physical phenomena based on the interaction of swift C60 ions with solids that were not possible using monatomic ion bombardments
Negative C60 ion beams provided to a tandem accelerator were generated using a Cs sputter negative ion source, which is generally used to produce heavy negative ion beams of monatomic and small polyatomic species
We report the ionization methods we developed for effective producing negative C60 ions without dissociation, using an ion source that is generally installed on tandem accelerators
Summary
The production of C60 ion beams in the MeV energy region using tandem accelerators in the 1990s enabled some physical phenomena based on the interaction of swift C60 ions with solids that were not possible using monatomic ion bombardments. Though it is simple to produce negative C60 ion beams, most of the C60 molecules dissociate due to sputtering with Cs ions. The beam intensity of C60 ions extracted from ion sources without dissociation is at most about 100 pA.
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